Electron-Beam-Induced Nanometer-Scale Deposition by N. Silvis-Cividjian PDF

By N. Silvis-Cividjian

ISBN-10: 0120147858

ISBN-13: 9780120147854

Advances in Imaging and Electron Physics merges long-running serials-Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. This sequence good points prolonged articles at the physics of electron units (especially semiconductor devices), particle optics at low and high energies, microlithography, snapshot technology and electronic photo processing, electromagnetic wave propagation, electron microscopy, and the computing equipment utilized in these kind of domain names.

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2005), Weber et al. (1995a) Bruckle et al. (1999), Floreani et al. (2001), Koops et al. (1988), Lee and Hatzakis (1989), Scho¨ssler et al. (1996) Utke et al. (2000a,b) Davies and Khamsehpour (1996), Harriot and Vasile (1988) Bezryadin and Dekker (1997) Yasaka et al. (1991) Bret et al. (2005) Bret et al. (2005) Bret et al. (2005) Bret et al. (2005) Bret et al. (2005) Guise et al. (2004a) Lau et al. (2002), Utke et al. (2004) Kislov et al. (1996), Matsui and Mori (1986) Luisier et al. (2004), Weber et al.

2005) performed compositional analysis on deposits from styrene, acrylic acid, propionic acid, acetic acid, and formic acid. It appears that the composition is close to C9H2O, regardless of the chemical composition of the precursors. The structures resulting from metal EBID in general consist of metal crystallites embedded in an amorphous carbon matrix. TEM images in general show small polycrystallites of less than 5 nm diameter, for instance, in the case of aurum (Lee and Hatzakis, 1989). Dubner et al.

2002b) for the Co(CO)8 precursor; they achieved 45 m Á cm in an ESEM. They wrote arches spanning the distance between the electrodes instead of lines lying on the substrate, a geometry that also might have influenced the resistivity. In a similar geometry, Madsen et al. 1 m Á cm for lines deposited from dimethyl gold acetylacetonate (DMG(acac)). ELECTRON‐BEAM–INDUCED NANOMETER‐SCALE DEPOSITION 41 Morimoto et al. (1996) measured the resistivity of platinum tips grown on SiO2 wafers and obtained a value of 30 m Á cm, three times higher than the bulk platinum value.

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Electron-Beam-Induced Nanometer-Scale Deposition by N. Silvis-Cividjian

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